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Material Preparation

CVD Furnace

The Chemical Vapour Deposition (CVD) Furnace is designed for thin film and nanomaterial growth under controlled gas environments. It supports advanced research in electronics, energy, and nanotechnology.

Models
CVD-1000
Models
CVD-1200
Models
CVD-1500

Technical Specifications

Operational Parameters
  • Maximum Temperature 1000–1500 °C
  • Furnace Tube Quartz or Alumina
  • Heating Zones Single or Multi-zone
  • Thermocouple Type Type K, R, or S
  • Gas Handling Multi-gas inlet, optional MFC
  • Controller PID programmable controller
variants
  • CVD-1000 1000 °C
  • CVD-1200 1200 °C
  • CVD-1500 1500 °C
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Primary Applications

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Thin Film Deposition

Deposition of functional thin films using chemical vapor deposition

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Graphene Growth

Synthesis of graphene and two-dimensional nanomaterials

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Nanomaterial Synthesis

Controlled growth of nanostructured materials for research

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